Reflection liquid crystal display device with reflection electrode region having two widths

ABSTRACT

Disclosed is a reflection type liquid crystal display device. A second substrate ( 220 ) is provided opposite to a first substrate ( 210 ) where pixels are formed. A liquid crystal layer ( 230 ) is interposed between the first and second substrates. A reflection electrode ( 235 ) is formed on the first substrate ( 210 ). The reflection electrode ( 235 ) includes first and second regions ( 290, 295 ) having relatively high and low heights so as to scatter a light, respectively. The first regions ( 290 ) have first widths in a first direction wider than second widths in a second direction so that a reflectivity in the first direction is higher than a reflectivity in the second direction. The widths of the grooves ( 290   a, b ) are varied in a desired direction regardless of shapes of the lenses ( 295 ), to thereby improve the viewing angle and reflectivity of the display in the specific direction.

TECHNICAL FIELD

The present invention relates to a reflection type liquid crystaldisplay device, and more particularly to a reflection type liquidcrystal display device having a reflection electrode on which aplurality of micro lenses are formed.

BACKGROUND ART

In the information society of these days, electronic display devices aremore important as information transmission media and various electronicdisplay devices are widely applied for industrial apparatus or homeappliances. Such electronic display devices are being continuouslyimproved to have new appropriate functions for various demands of theinformation society.

In general, electronic display devices display and transmit variouspieces of information to users who utilize such information. That is,the electronic display devices convert electric information signalsoutputted from electronic apparatus into light information signalsrecognized by users through their eyes.

In the electronic display devices dividing into an emissive displaydevice and a non-emissive display device, the emissive display devicedisplays light information signals through a light emission phenomenathereof and the non-emissive display device displays the lightinformation signals through a reflection, a scattering or aninterference thereof. The emissive display device includes a cathode raytube (CRT), a plasma display panel (PDP), a light emitting diode (LED)and an electroluminescent display (ELD). The emissive display device iscalled as an active display device. Also, the non-emissive displaydevice, called as a passive display device, includes a liquid crystaldisplay (LCD), an electrochemical display (ECD) and an electrophoreticimage display (EPID).

The CRT has been used for a television receiver or a monitor of acomputer as the display device for a long time since it has a highquality and a low manufacturing cost. The CRT, however, has somedisadvantages such as a heavy weight, a large volume and a high powerdissipation.

Recently, the demand for a new electronic display device is greatlyincreased such as a flat panel display device having excellentcharacteristics, for example, thin thickness, light weight, low drivingvoltage and low power consumption. Such flat panel display devices canbe manufactured according to the rapidly improved semiconductortechnology.

In the flat panel devices, a liquid crystal display (LCD) device hasbeen widely utilized for various electronic devices because the LCDdevice has thin thickness, low power dissipation and high displayquality approximately identical to those of the CRT. Also, the LCDdevice can be operated under a low driving voltage and can be easilymanufactured so that the LCD device is widely used for variouselectronic apparatuses.

The LCD devices are generally divided into a transmission type LCDdevice, a reflection type LCD device, and a reflection-transmission typeLCD device. The transmission type LCD device displays information byusing an external light source and the reflection type LCD devicedisplays information by using a natural light. Thereflection-transmission type LCD device operates in a transmission modefor displaying an image using a built-in light source of the LCD devicein a room or in a dark place where an external light source does notexist, and operates in a reflection mode for displaying the image byreflecting an incident light in the outside.

The reflection type liquid crystal display device, however, showsrelatively dark images and cannot sufficiently apply to display finepitches or color images, so the reflection type liquid crystal displaydevice has been utilized to only display simple figures or letters.Hence, the reflection type liquid crystal display device should havefine pitches and a high reflectivity as well as display color images inorder to be used for various electronic display devices. In addition,the reflection type liquid crystal display device has a sufficientbrightness, a rapid response speed, and an improved image contrast.

In the recent reflection type liquid crystal display device, thebrightness of the reflection type liquid crystal display device has beenimproved by means of combining the increase of the reflectivity of thereflection electrode with the super aperture ratio technology. Areflection electrode having numerous fine convexes and concaves isdisclosed in U.S. Pat. No. 5,610,741 issued to Naofumi Kimura, entitled“REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE WITH BUMPS ON THEREFLECTOR”.

Meanwhile, the present inventors have been developed a reflectionelectrode causing a uniform diffused reflection to improve the qualityof an image and filed this invention in Korean Intellectual PropertyOffice (KIPO) on Mar. 4th, 1999. Such reflection electrode is disclosedin Korean Ser. No. 1999-7093, entitled “A REFLECTION TYPE LIQUID CRYSTALDISPLAY DEVICE AND A METHOD FOR MANUFACTURING THE SAME” which is nowpending in KIPO and is subject to the applicant of this application.

FIG. 1 is a plane view showing a reflection electrode or patterns on aphoto mask for forming the reflection electrode according to theabove-mentioned application.

Referring to FIG. 1, the reflection electrode includes a first region 14and second region 16, which have relatively high and low heights in apixel area. The second region 16 is enclosed with the first region 14such as closed curves. The first region 14 is formed to have a constantwidth. The first region 14 has a groove shape having a height relativelylower than the second region 16. The second region 16 has a protuberanceshape having a height relatively higher than the first regions 14, sothe second region 16 functions as a micro lens.

To form a plurality of micro lenses on the reflection electrode, anorganic insulating layer is formed on a first insulating substratehaving thin film transistors and then, should be exposed and developedusing a photo mask having the patterns shown in FIG. 1.

FIGS. 2A and 2B are cross-sectional views taken along lines of A₁-A_(1′)and B₁-B_(1′) in FIG. 1, which illustrate a method of forming aplurality of grooves on the organic insulation layer.

Referring to FIGS. 2A and 2B, a photo mask 20 having patternscorresponding to grooves for forming micro lenses is located over anorganic insulation layer 12 in order to form a plurality of firstregions 14 having the groove shape thereon. In this case, the photo mask20 has the patterns identical to the shape of the reflection electrodeshown in FIG. 1. Specifically, mask patterns corresponding to the firstregions 14 are formed on a transparent substrate, thereby forming thephoto mask 20 as shown in FIG. 1. After the organic insulation layer 12is exposed and developed using the photo mask 20, a plurality of grooves14 (that is, the first regions 14) are formed in the surface of theorganic insulation layer 12.

Each of the first regions 14 is formed such that a width W_(a) in afirst direction (that is, the line of A₁-A_(1′) in FIG. 1) is identicalto a width W_(b) in a second direction (that is, the line of B₁-B_(1′)in FIG. 1). Since the first regions 14 are formed to have uniform widthsW_(a) and W_(b), a reflective efficiency is increased to thereby improvean image quality of the reflection type liquid crystal display device.

The above-mentioned reflection electrode has constant reflectivityconcerning all directions including the horizontal and verticaldirections because the micro lenses of the reflection electrode (thatis, the second regions 16) are isotropically formed in all directions.The reflection electrode, however, cannot be applied to an electronicdevice demanded to have high reflectivity in a certain direction such asa cellular phone. In case that the entire patterns may be varied inorder to increase the reflectivity of the reflection electrode in aspecific direction, processing conditions should be optimized once moreand other problem such as a symmetry concerning the entire substratesmay occur.

DISCLOSURE OF THE INVENTION

The present invention has been made to solve the aforementioned problem,and accordingly it is an object of the present invention to provide areflection type liquid crystal display device that can control areflectivity thereof in a specific direction regardless of shapes oflenses.

It is another object of the present invention to provide an electronicdisplay device that can control a reflectivity thereof in a specificdirection regardless of shapes of lenses.

To achieve one object of the present invention, there is provided areflection type liquid crystal display device comprises a firstsubstrate on which pixels are formed, a second substrate disposedopposite to the first substrate, a liquid crystal layer formed betweenthe first substrate and the second substrate, and a reflection electrodeformed on the first substrate and has a first region and a second regionthat have relatively high and low heights for scattering a light. Thefirst region has a first width in a first direction wider than a secondwidth in a second direction in order to have a first reflectivity in thefirst direction relatively higher than a second reflectivity in thesecond direction.

In a preferred aspect of the present invention, the first region has agroove shape having a height relatively lower than the second region,and the second region has a protuberance shape having a heightrelatively higher than the first region. The first region has a firstgroove successively formed in the first direction and second groovessuccessively formed in the second direction.

To achieve the other object of the present invention, there is providedan electronic display device comprises an insulation substrate on whichpixels are formed, and reflection means connected to the pixels andformed on the first substrate. The reflection means have a plurality offirst regions and a plurality of second regions that have relativelyhigh and low heights for scattering a light. The first region has afirst width in a first direction wider than a second width in a seconddirection in order to have a first reflectivity in the first directionrelatively higher than a second reflectivity in the second direction.

According to the present invention, the reflection electrode of thereflection type liquid crystal display device has grooves having widewidths in a direction of the pixel where the high reflectivity isdemanded. Thus, the reflection type liquid crystal display device has animproved aperture ratio and an increased reflectivity in a specificallydesired direction by varying the widths of the grooves regardless ofshapes of the lenses.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects and advantages of the present invention willbecome readily apparent by reference to the following detaileddescription when considered in conjunction with the accompanyingdrawings wherein:

FIG. 1 is a plan view showing a reflection electrode or patterns on aphoto mask for forming the reflection electrode disclosed in Korean Ser.No. 1999-7093;

FIGS. 2A and 2B are cross-sectional views taken along lines of A₁-A_(1′)and B₁-B_(1′) in FIG. 1 for illustrating a method of forming a pluralityof grooves on an organic insulation layer;

FIG. 3 is a plan view showing a reflection electrode or patterns on aphoto mask for forming the reflection electrode according to a firstembodiment of the present invention;

FIG. 4 is a cross-sectional view of a reflection type liquid crystaldisplay device having the reflection electrode according to the firstembodiment of the present invention;

FIGS. 5A to 5E are cross-sectional views illustrating a method ofmanufacturing the reflection type liquid crystal display device shown inFIG. 4;

FIG. 6 is a plane view showing a reflection electrode or patterns on aphoto mask for forming the reflection electrode according to a secondembodiment of the present invention; and

FIGS. 7A and 7B are cross-sectional views taken along lines of A₆-A_(6′)and B₆-B_(6′) in FIG. 6 for illustrating a method of forming a pluralityof grooves on an organic insulation layer.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, a reflection type liquid crystal display device accordingto the preferred embodiments of the present invention will be describedin detail with reference to the accompanying drawings.

FIG. 3 is a plan view showing a reflection electrode or patterns on aphoto mask for forming the reflection electrode according to a firstembodiment of the present invention.

Referring to FIG. 3, a reflection electrode according to the firstembodiment of the present invention has first regions 290 and secondregions 295, which are formed within a pixel area and have relativelyhigh and low heights. The first regions 290 include a plurality of firstgrooves 290 a and a plurality of second grooves 290 b, wherein the firstgrooves 290 a are continuously formed along a horizontal direction ofthe pixel area and the second grooves 290 b are successively formed in avertical direction of the pixel area. The second grooves 290 b havewidths wider than those of the first grooves 290 b so that a viewingangle of the display is insured concerning the vertical direction of thepixel area (that is, up and down directions) and a reflectivity isimproved.

The first regions 290 are formed in the shape of grooves having heightsrelatively lower than those of the second regions 295, while the secondregions 295 are formed to in the shape of protuberances having heightsrelative higher than those of the first regions 290, so they play a roleof micro lenses.

FIG. 4 is a cross-sectional view illustrating a reflection type liquidcrystal display device having the reflection electrode according to thefirst embodiment of the present invention.

Referring to FIG. 4, the reflection type liquid crystal display devicehas a first substrate 210, a second substrate 220, a liquid crystallayer 230, and a reflection electrode 235. Pixels are formed on thefirst substrate 210 and the second substrate 220 is disposedcorresponding to the first substrate 210. The liquid crystal layer 230is formed between the first substrate 210 and the second substrate 220.The reflection electrode 235 is a pixel electrode of the reflection typeliquid crystal display device.

The first substrate 210 includes a first insulation substrate 240 andthin film transistors (TFT) 245 formed on the first insulation substrate240. The thin film transistor 245 functions as a switching element. Thethin film transistor 245 has a gate electrode 250, a gate insulationlayer 255, an active layer 260, an ohmic contact layer 265, a sourceelectrode 270, and a drain electrode 275.

An organic insulation layer 280 composed of a photosensitive materialsuch as a photoresist is formed on the first insulation layer 240including the thin film transistors 245. Contact holes 285 are formedthrough the organic insulation layer 280 to partially expose the drainelectrodes 275 of each of the thin film transistors 245.

The reflection electrodes 235 are formed on the contact holes 285 andthe organic insulation layer 280. Each of the reflection electrodes 235is connected to the corresponding drain electrode 275 through thecontact holes 285, so that each of the thin film transistors 245 iselectrically connected with the corresponding reflection electrode 235.

A first orientation layer 300 is formed on the reflection electrodes 235and the organic insulation layer 280.

The second substrate 220 is disposed opposite to the first substrate 210and includes a second insulation substrate 305, a color filter 310, acommon electrode 315, a second orientation layer 320, a phase plate 320,and a polarization plate 330.

The second insulation substrate 305 is composed of the materialidentical to that of the first insulation substrate 240, for example,glass or ceramic. The phase plate 325 and the polarization plate 330 areformed on the second insulation substrate 305, successively. The colorfilter 310 is disposed beneath the second insulation substrate 305. Thecommon electrode 315 and the second orientation layer 320 are formedbeneath the second insulation substrate 305 in turn. The secondorientation layer 320 and the first orientation layer 300 of the firstsubstrate 210 play a role of pre-tilting liquid crystal molecules of theliquid crystal layer 230 by a predetermined angle.

Spacers 335 and 336 are interposed between the first substrate 210 andthe second substrate 220 to provide a predetermined space between thefirst substrate 210 and the second substrate 220. The liquid crystallayer 230 is formed in the space between the first substrate 210 and thesecond substrate 220.

Hereinafter, a method of manufacturing the reflection type liquidcrystal display device in FIG. 4 will be described in detail withreference to the accompanying drawings.

FIGS. 5A to 5E are cross-sectional views illustrating a method ofmanufacturing the reflection type liquid crystal display device in FIG.4. In FIGS. 5A to 5E, the same reference numerals are used for theelements identical to those in FIG. 4.

Referring to FIG. 5A, a first metal film made of aluminum (Al), chrome(Cr) or molybdenum-tungsten (Mo—W) is formed on a first insulationsubstrate 240 composed of an insulation material such as glass, ceramic,etc. Then, the first metal film is patterned to form gate lines (notshown) and gate electrodes 250 branched from each of the gate lines.Then, a gate insulation layer 255 composed of silicon nitride is formedon the entire surface of the first insulation substrate 240 includingthe gate electrodes 250. Preferably, the gate insulation layer 255 isformed by a plasma enhanced chemical vapor deposition (PECVD) method.

After successively depositing an amorphous silicon layer and an in-situdoped amorphous silicon layer on the gate insulation layer 255 by thePECVD method, these amorphous silicon layers are patterned to formactive layers 260 and ohmic contact layers 265 on the gate insulationlayer 255 under which the gate electrodes 250 are positioned.

Subsequently, after depositing a second metal film made of chrome (Cr)on the resultant structure, the second metal film is patterned to formdata lines (not shown), source electrodes 270, and drain electrodes 275,whereby completing thin film transistors 245. Each of the thin filmtransistors 245 includes the gate electrode 250, the active layer 269,the ohmic contact layer 265, the source electrode 270 and the drainelectrode 275. The data line is perpendicular to the gate line, and thesource and drain electrodes 270 and 275 are branched from the data line.The gate insulation layer 255 is positioned between the gate line andthe data line so that the gate line does not contact with the data line.

Then, a photoresist is coated by a spin coating method on the entiresurface of the first insulation substrate 240 on which thin filmtransistors 245 are formed, thereby forming an organic insulation layer280 having a thickness of approximately 1 to 3 μm on the firstinsulation substrate 240.

Referring to FIG. 5B, after a first mask 450 for forming contact holes285 is positioned over the organic insulation layer 280, the organicinsulating layer 280 is exposed and developed using the first mask. As aresult, the contact holes 285 are formed through the organic insulatinglayer 280 to partially expose the corresponding drain electrodes 275 andsimultaneously, a plurality of grooves are formed at the surface of theorganic insulation layer 280. The process of forming the contact holes285 through the organic insulation layer 280 and the process of formingthe grooves in the organic insulation layer 280 will be described asfollows.

FIGS. 5C and 5D are cross-sectional views taken along lines of A₃-A_(3′)and B₃-B_(3′) in FIG. 3, which specifically show the process of formingthe contact holes 285 in FIG. 4B and the process of forming the grooves,respectively.

First, in order to form the contact holes 285 in the organic insulationlayer 280, the first mask 450 (see in FIG. 4B) is located over theorganic insulation layer 280 composed of the photo resist. The firstmask 450 has patterns corresponding to the contact holes 285. Then, aportion of the organic insulation layer 280 over the drain electrodes275 is primarily exposed through a full exposure process.

Then, a second mask 500 for forming micro lenses, which has patternscorresponding to the grooves, is positioned over the organic insulationlayer 280 in order to form a plurality of grooves 290 a and 290 b in thesurface of the organic insulation layer 280 as shown in FIGS. 5C and 5D.The second mask 500 includes patterns having shapes identical to thoseof the reflection electrode 235 in FIG. 3. Specifically, the patternsare formed on a transparent substrate so as to have a first widths ofthe grooves (W_(1a)) along a first direction of the pixel (that is, theline of A₃-A_(3′) in FIG. 3) are narrower than second widths of thegrooves (W_(1b)) along a second direction of the pixel (that is, theline of B₃-B_(3′) in FIG. 3), thereby completing the second mask 500.The first and second directions of the pixel correspond to thehorizontal and vertical directions of the pixel, respectively.

The organic insulation layer 280 except the contact hole 285 issecondarily exposed using the second mask 500 by a lens exposure process(an exposure process for forming lenses).

Then, the organic insulation layer 280 is developed to thereby form thecontact holes 285 exposing the corresponding drain electrodes 275through the organic insulation layer 280 and the grooves in the surfaceof the organic insulation layer 280. That is, the grooves includingfirst and second grooves 290 a and 290 b are successively formed in thesurface of the organic insulation layer 280, wherein the first grooves290 a having the first width are formed along the first direction (i.e.,the horizontal direction) of the pixel and the second grooves 290 bhaving the second width wider than the first width are formed along thesecond direction (i.e., the vertical direction) of the pixel. Hence, thesurface of the organic insulation layer 280 is divided into firstregions 290 composed of a plurality of grooves successively formed andsecond regions 295 made of a plurality of protuberances enclosed withthe first regions 290.

Referring to FIG. 5E, after depositing a third metal film on the organicinsulation layer 280 in which the grooves are formed, the third metalfilm is patterned to form reflection electrodes 235 having shapes of thepredetermined pixel as shown in FIG. 4. The third metal film comprises ametal having good reflectivity such as aluminum (Al), nickel (Ni),chrome (Cr), silver (Ag), etc. Then, a photoresist is coated on thereflection electrodes 235 and treated by a rubbing process, therebyforming a first orientation layer 300 that pre-tilts the liquid crystalmolecules of a liquid crystal layer 230 by a predetermined angle.

Each of the reflection electrodes 235 has a shape identical to that ofthe surface of the organic insulation layer 280. The reflectionelectrode 235 is divided into the first regions 290 having numerousgrooves formed on the grooves of the organic insulation layer 280 andthe second regions 295 including numerous protuberances, whichcorresponds to micro lens regions. Preferably, the first regions 290have the construction in which a plurality of first grooves and aplurality of second grooves are continuously formed. The first grooveshaving a first width are formed along the first direction (that is, thehorizontal direction) of the pixel and the second grooves having asecond width wider than the first width are formed along the seconddirection (that is, the vertical direction) of the pixel. According tothe reflection electrode having the above structure, the viewing angleand the reflectivity of the display is improved in the upward anddownward directions because the second grooves along the seconddirection (i.e., the vertical direction) is formed to a width wider thanthat of the first grooves along the first direction (i.e., thehorizontal direction).

Now referring to FIG. 5E, a color filter 310, a common electrode 315,and a second orientation layer 320 are successively formed on a secondinsulation substrate 305 composed of the material identical to that ofthe first insulation substrate 240, thereby completing a secondsubstrate 220.

After the second substrate 220 is disposed opposite to the firstsubstrate 210, the first and second substrates 210 and 220 are combinedwith each other by interposing spacers 335 between the first substrate210 and the second substrate 220. Thus, a predetermined space isprovided between the first substrate 210 and the second substrate 220.Then, liquid crystal is introduced into the space between the firstsubstrate 210 and the second substrate 220 by a vacuum injection methodto form a liquid crystal layer 230, whereby completing the reflectiontype liquid crystal display device according to the present embodiment.In this case, a polarization plate 330 and a phase plate 325 may beformed a front face of the second substrate 220. In addition, a blackmatrix (not shown) may be disposed between the second insulationsubstrate 305 and the color filter 310.

According to the first embodiment of the present invention, in thereflection electrode 235 composed of a plurality of first regions 290having a groove shape and a plurality of second region 295 having aprotuberance shape, the second grooves 290 b formed along the verticaldirection of the pixel have the width wider than those of the firstgrooves 290 a formed along the horizontal direction of the pixel in thefirst regions 290. Therefore, the viewing angle of the display issecured along the upward and downward directions and the reflectivity ofthe display increases in the upward and downward directions of the pixelbecause the grooves of the reflection electrode 235 formed along thevertical direction of the pixel have the width wider than those of thegrooves formed along the horizontal direction of the pixel.

FIG. 6 is a plan view showing a reflection electrode or patterns on aphoto mask for forming the reflection electrode according a secondembodiment of the present invention.

Referring to FIG. 6, a reflection electrode of the present embodiment isdivided into first regions 290 and second regions 295, which haverelatively high and low heights in a pixel area. The first regions 290have a groove shape that have a height relatively lower than the secondregions 295, and the second regions 295 have a protuberance shape thathave a height relatively higher than the first regions 290, so thesecond regions 295 function as micro lenses.

The first regions 290 include a plurality of first grooves 290 acontinuously formed along the horizontal direction of the pixel and aplurality of second grooves 290 b successively formed along the verticaldirection of the pixel. The first grooves 290 a have widths wider thanthose of the second grooves 290 b, respectively. Thus, the viewing angleof the display is secured along the left and right directions of thepixel and the reflectivity of the display increases in the left and theright directions of the pixel because the grooves formed along thehorizontal direction of the pixel have the width wider than the width ofgrooves formed along the vertical direction of the pixel.

A method of forming numerous grooves on an organic insulation layer inorder to provide the reflection electrode having the above-mentionedconstruction will be described as follows.

FIG. 7A is a cross-sectional view taken a line of A₆-A_(6′) in FIG. 6and FIG. 7B is a cross-sectional view taken a line of B₆-B_(6′) in FIG.6, which illustrate the method of forming numerous grooves on theorganic insulation layer.

Referring to FIGS. 7A and 7B, in order to form a plurality of grooves290 a and 290 b in the organic insulation layer 280, a mask 510 forforming micro lenses, which has patterns corresponding to numerousgrooves, is disposed over an organic insulation layer 280. Specifically,mask patterns are formed on a transparent substrate so as to have awidth (W_(2a)) of grooves along a first direction of the pixel (that is,the line of A₆-A_(6′) in FIG. 6) are wider than a width (W_(2b)) ofgrooves a second direction of the pixel (that is, the line of B₆-B_(6′)in FIG. 6), thereby completing the mask 510. The first and seconddirections of the pixel correspond to the horizontal and verticaldirections of the pixel, respectively.

After the organic insulation layer 280 is exposed and developed usingthe mask 510 by a lens exposure process, numerous grooves arecontinuously formed in the surface of the organic insulation layer 280.That is, the first grooves 290 a having first widths are formed alongthe first direction of the pixel (i.e., the horizontal direction of thepixel), and the second grooves 290 b having second widths aresimultaneously formed along the second direction of the pixel (i.e., thevertical direction of the pixel). Preferably, the first widths of thefirst grooves 290 a are wider than the second widths of the secondgrooves 290 b. Hence, the surface of the organic insulation layer 280 isdivided into the first regions 290 composed of numerous groovessuccessively formed and the second regions 295 composed of numerousprotuberances enclosed by the first regions 290.

According to the present invention as described above, grooves of thereflection electrode are formed so as to have a wide width in adirection of the pixel where the high reflectivity is demanded. Thus,the widths of the grooves are varied in a desired direction regardlessof shapes of the lenses, to thereby secure the viewing angle of thedisplay along the specific direction and increase the reflectivity inthe specific direction.

Although the preferred embodiments of the present invention have beendescribed, it is understood that the present invention should not belimited to these preferred embodiments but various changes andmodifications can be made by one skilled in the art within the spiritand scope of the present invention as hereinafter claimed.

1. A liquid crystal display device, comprising: a first substrate onwhich pixels are formed, the first substrate including a photosensitiveinsulation layer thereon; a second substrate disposed opposite to thefirst substrate; a liquid crystal layer formed between the firstsubstrate and the second substrate; and a reflection electrode formed onthe photosensitive insulation layer, the reflection electrode includingfirst and second regions that have relatively high and low heights toscatter a light on the first substrate, wherein the first region has afirst width in a first direction wider than a second width in a seconddirection in order to have a first reflectivity in the first directionrelatively higher than a second reflectivity in the second direction,and wherein the first region has a first depth in the first directiongreater then a second depth in the second direction.
 2. The liquidcrystal display device of claim 1, wherein the first region has a grooveshape having a height relatively lower than a height of the secondregion, and the second region has a protuberance shape having a heightrelatively higher than the height of the first region.
 3. The liquidcrystal display device of claim 1, wherein the first region is comprisedof a first groove continuously formed in the first direction and asecond groove continuously formed in the second direction.
 4. The liquidcrystal display device of claim 1, wherein the second region is enclosedby the first region.
 5. The liquid crystal display device of claim 1,wherein the first direction is a horizontal direction of the pixel andthe second direction is a vertical direction of the pixel.
 6. The liquidcrystal display device of claim 1, wherein the first direction is avertical direction of the pixel and the second direction is a horizontaldirection of the pixel.
 7. The liquid crystal display device of claim 1,wherein the pixels are comprised of thin film transistors serving asswitching elements.
 8. The liquid crystal display device of claim 1,wherein the photosensitive insulation layer has a same structure as inthe reflection electrode.
 9. The liquid crystal display device as claim1, wherein the reflection electrode is comprised of any one selectedfrom the groups of aluminum (Al), nickel (Ni), chrome (Cr) and silver(Ag).
 10. A liquid crystal display device, comprising: an insulationsubstrate; a thin film transistor formed on the insulation substrate,the thin film transistor including a gate electrode, a gate insulationlayer, an active layer, a source electrode and a drain electrode; aphotosensitive insulation layer formed on the insulation substrate andthe thin film transistors, the photosensitive insulation layer having acontact hole exposing a portion of the drain electrode; and a reflectionelectrode formed on the photosensitive insulation layer so as to beconnected to the drain electrode through the contact hole, thereflection electrode including first and second regions which haverelatively high and low heights to scatter a light; wherein the firstregion has a first width in a first direction wider than a second widthin a second direction in order to have a first reflectivity in the firstdirection relatively higher than a second reflectivity in the seconddirection, and wherein the first region has a first depth in the firstdirection greater then a second depth in the second direction.
 11. Theliquid crystal display device of claim 10, wherein the first region hasa groove shape having a height relatively lower than a height of thesecond region, and the second region has a protuberance shape having aheight relatively higher than the height of the first region.
 12. Theliquid crystal display device of claim 10, wherein the first regioncomprises a first groove continuously formed in the first direction anda second groove continuously formed in the second direction.
 13. Theliquid crystal display device of claim 10, wherein the second region isenclosed with the first region.
 14. The liquid crystal display device ofclaim 10, wherein the photosensitive insulation layer has a samestructure as in the reflection electrode.
 15. The liquid crystal displaydevice as claim 10, wherein the reflection electrode is comprised of anyone selected from the groups of aluminum (Al), nickel (Ni), chrome (Cr)and silver (Ag).
 16. An electronic display device, comprising: aninsulation substrate on which pixels are formed, the insulationsubstrate having a photosensitive insulation layer thereon; and areflection unit formed on the photosensitive insulation layer so as tobe connected to the pixels, the reflection unit having a plurality offirst regions and a plurality of second regions which have relativelyhigh and low heights to scatter a light; wherein the first region has afirst width in a first direction wider than a second width in a seconddirection in order to have a first reflectivity in the first directionrelatively higher than a second reflectivity in the second direction,and wherein the first region has a first depth in the first directiongreater than a second depth in the second direction.
 17. The electronicdisplay device of claim 16, wherein the first region has a groove shapehaving a height relatively lower than a height of the second region, andthe second region has a protuberance shape having a height relativelyhigher than the heights of the first region.
 18. The electronic displaydevice of claim 16, wherein the first region comprises a first groovescontinuously formed in the first direction and second groovescontinuously formed in the second direction.
 19. The electronic displaydevice of claim 16, wherein the first direction is a horizontaldirection of the pixel and the second direction is a vertical directionof the pixel.
 20. The electronic display device of claim 16, wherein thefirst direction is a vertical direction of the pixel and the seconddirection is a horizontal direction of the pixel.
 21. A method ofmanufacturing a liquid crystal display device, comprising: forming athin film transistor on a first insulation substrate; coating aphotosensitive insulation material on the first insulation substrate onwhich the thin film transistor is formed; forming a contact hole, aplurality of first grooves having a first width along a first directionand a plurality of second grooves having a second width along a seconddirection on the coated photosensitive insulation material to form aphotosensitive insulation layer; depositing a metal on thephotosensitive insulation layer; patterning the deposited metal to forma reflection electrode; forming a common electrode on a secondinsulation substrate; and interposing a liquid crystal into a spacebetween the first insulation substrate having the reflection electrodeand the second insulation substrate having the common electrode, whereina first depth of each of the first grooves is greater than a seconddepth of each of the second grooves.
 22. The method of claim 21, whereinthe photosensitive insulation material is coated by a spin coatingmethod.
 23. The method of claim 21, wherein the photosensitiveinsulation layer is formed by: exposing the coated photosensitiveinsulation material using a first mask having a pattern corresponding tothe contact hole; exposing the exposed photosensitive insulationmaterial using a second mask having patterns corresponding to thegrooves; and developing the photosensitive insulation material.
 24. Themethod of claim 23, wherein the coated photosensitive insulationmaterial is exposed through a full exposure process.
 25. The method ofclaim 23, wherein the exposed photosensitive insulation material isexposed through a lens exposure process.
 26. A liquid crystal displaydevice, comprising: a first substrate on which pixels are formed, thefirst substrate including a photosensitive insulation layer thereon; asecond substrate disposed opposite to the first substrate; a liquidcrystal layer formed between the first substrate and the secondsubstrate; and a reflection electrode formed on the photosensitiveinsulation layer, the reflection electrode including first and secondregions, that have relatively high and low heights for scattering alight on the first substrate, wherein the second region is higher thanthe first region and is enclosed by the first region; wherein a planview of the second region has a polygonal shape of more than four sides;wherein the first region has a first width in a first direction widerthan a second width in a second direction in order to have a firstreflectivity in the first direction relatively higher than a secondreflectivity in the second direction, and wherein the first region has afirst depth in the first direction greater than a second depth in thesecond direction.
 27. A liquid crystal display device, comprising: aninsulation substrate; a thin film transistor formed on the insulationsubstrate, the thin film transistor including a gate electrode, a gateinsulation layer, an active layer, a source electrode and a drainelectrode; a photosensitive insulation layer formed on the insulationsubstrate and the thin film transistor, the photosensitive insulationlayer having a contact hole exposing a portion of the drain electrode;and a reflection electrode formed on the photosensitive insulation layerso as to be connected to the drain electrode through the contact hole,the reflection electrode including first and second regions, which haverelatively high and low heights for scattering a light; wherein thesecond region is higher than the first region and is enclosed by thefirst region; wherein a plan view of the second region has a polygonalshape of more than four sides; wherein the first region has a firstwidth in a first direction wider than a second width in a seconddirection in order to have a first reflectivity in the first directionrelatively higher than a second reflectivity in the second direction,and wherein the first region has a first depth in the first directiongreater than a second depth in the second direction.
 28. An electronicdisplay device, comprising: an insulation substrate on which pixels areformed, the first substrate including a photosensitive insulation layerthereon; and reflection means formed on the photosensitive insulationlayer so as to be connected to the pixels, the reflection means having aplurality of first regions and a plurality of second regions, which haverelatively high and low heights for scattering a light; wherein thesecond region is higher than the first region and is enclosed by thefirst region; wherein a plan view of the second region has a polygonalshape of more than four sides; wherein the first region has a firstwidth in a first direction wider than a second width in a seconddirection in order to have a first reflectivity in the first directionrelatively higher than a second reflectivity in the second direction,wherein the first region has a first depth in the first directiongreater than a second depth in the second direction.